Equipment Name

Inline Acid Polishing Equipment

Equipment Model

SC-LSP4500/ SC-LSP8000

Equipment Application

Etching/polishing,cleaning and drying of mono/multi crystalline solar cells.

Process Flow

Water layer protection→Etching/Polishing→Alkaline cleaning→Acid Cleaning→Drying.

Features

· High Throughput: 5-lane 4500pcs/h; 10-lane 8000pcs/h.

· Excellent Uniformity, long bath lifetime.

· Various additives or mixed additives technology.

· Wafer thickness handling capability up to 120μm

· Quick inline bath change.

· Suitable for rear side polishing and with low chemical consumption

· Suitable with MES ; Inline weight testing is optional.

· Compatible with acid polish function.

Parameters